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PRINT ISSN : 2319-7692 Online ISSN : 2319-7706 Issues : 12 per year Publisher : Excellent Publishers Email : editorijcmas@gmail.com / submit@ijcmas.com Editor-in-chief: Dr.M.Prakash Index Copernicus ICV 2018: 95.39 NAAS RATING 2020: 5.38 |
A low cost column mode device was designed and fabricated for removal of trivalent and pentavalent arsenic from water. The chemically modified chitosan was entrapped in polyurethane matrix and used as a column bed for adsorption for both the forms of arsenic. The chemical modification of chitosan was achieved by pre-treatment with ferrous oxide manganese oxide. The column bed exhibited 75% of As(III) and 72 % of As(V) removal at 1000 ppb concentration. The flow rate of the arsenic solution through column matrix directly influenced the removal and the flow rate of 100 mL min-1showed two to three folds higher removal of arsenic as compared to 200 mL min-1. The design and the process of preparation of chemically modified chitosan are the novel findings of the study.
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